Programmable Spin Coating Unit

spin coating unit

Programmable Spin Coating Unit

Application of Programmable Spin Coating Unit:-

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.

Technical Specifications:

• Polypropylene Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch.
• 500 – 9999 RPM
• Accuracy<±0.5% of Full Speed
• Microprocessor Programmable Speed control with respect to time Preset editable programs of 1 program 64 segments.
• Real time display of RPM, time and program stamps
• Nonvolatile program memory
• Input & control through soft touch key pad.
• Vacuum release switch
• Substrate size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch (For glass substrate) & 20.0 sq. inch (for silicon
wafers)
• Vacuum chuck: derlin made circular substrate
holders of Dia
• 0.5”,1”,1.5”,2.0” inch
• Microprocessor control A C brush less motor.
• Acceleration 2000 rpm/sec (Maximum) use settable.
• Calibration option.
• Vacuum Dial gauge.
• Frame: Epoxy coated MS.
• Facility for interlocking with Vacuum Pump.
• Tubing for Vacuum.
• Gas Purging Attachment for Nitrogen.
• Spill drainage facility
• To operate on 230V ± 10%, 1 phase 50 Hz AC only.
• Maximum Power 190W, Current 1.0 Amp.

ModelTechnical NameTechnical Parameters
HE115 NFlow rate50 Hz1.8CFM
51 l/min
60 Hz2.0CFM
57 l/min
 Ultimate vacuumPartial Pressure2 Pa
Total Pressure150 micron
Power¼ HP
Inlet Port¼” Flare

Product Specification

BrandHarrier Enterprises
AutomationType Automatic
Country of OriginMade in India
Vacuum730 mm Hg 97.33 kPa
Maximum Power190 W
Power Supply230V 10%
PhaseSingle Phase
Frequency50 Hz
Minimum Order Quantity1 Unit

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